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TESCAN

FIB-SEM Focused Ion Beam
Scanning Electron Microscope

Advanced dual-beam system for nanoscale analysis, cross-section preparation, 3D tomography and in-situ material characterization.

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TESCAN FIB-SEM — Focused Ion Beam Scanning Electron Microscope

TESCAN IC-TSCAN-001
★★★★★
5.0 — Trusted by 50+ Egyptian Research Institutions
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The TESCAN FIB-SEM combines a focused ion beam column with a high-resolution scanning electron microscope in a single platform. Ideal for advanced materials research, semiconductor failure analysis, geological sample preparation, and 3D nano-tomography. Delivers sub-nanometer resolution with exceptional stability and versatility.

Sub-nm SEM Resolution
Dual-Beam System
3D Tomography
In-Situ Analysis
EDX / WDS / EBSD
Automated Workflows
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Warranty
1 Year Full
Installation
On-Site
Support
24/7 Technical

About the TESCAN FIB-SEM

The TESCAN FIB-SEM is a state-of-the-art analytical instrument that integrates a Gallium focused ion beam (FIB) column with a high-resolution field-emission scanning electron microscope (FE-SEM) into a single, compact system. This dual-beam configuration enables a wide range of applications — from nanoscale imaging and elemental analysis to site-specific sample preparation and 3D volume reconstruction.

Designed for demanding research environments, the system features TESCAN's proprietary wide-field optics (WFO) technology, which delivers exceptional depth of field and high-quality imaging across a wide range of beam currents. The integrated AutoLoader option enables automated, unattended sample exchange for high-throughput workflows.

Equipped with a comprehensive suite of detectors — including EDX, WDS, EBSD, and cathodoluminescence — the FIB-SEM provides a complete materials characterization solution in a single instrument.

TESCAN FIB-SEM Overview
SEM Resolution0.7 nm at 15 kV (STEM mode) / 1.0 nm at 1 kV
FIB Resolution2.5 nm at 30 kV
SEM Accelerating Voltage200 V – 30 kV
FIB Accelerating Voltage1 kV – 30 kV
FIB Beam Current1 pA – 100 nA
SEM Beam Current1 pA – 400 nA
Ion SourceGallium Liquid Metal Ion Source (LMIS)
Stage5-axis eucentric motorized stage
Sample SizeUp to 150 mm wafer (optional)
Detectors (Standard)SE, BSE, In-Beam SE, In-Beam BSE
Optional DetectorsEDX, WDS, EBSD, CL, STEM, TKD
Gas Injection SystemUp to 6 precursor gases (GIS)
Vacuum SystemOil-free turbomolecular pumps
Chamber Pressure< 2×10⁻⁴ Pa
Operating SystemWindows 10 / TESCAN ESSENCE™ Software
Power Requirements200–240 V, single phase, 50/60 Hz
Semiconductor Analysis
Failure analysis, circuit edit, and cross-section preparation for IC devices and advanced packaging.
Materials Science
Microstructure characterization, grain boundary analysis, and phase identification of metals and alloys.
3D Nano-Tomography
Serial sectioning and 3D reconstruction of complex materials at nanometer resolution.
Life Sciences
Biological sample preparation for TEM, ultra-thin sectioning, and cryo-FIB workflows.
Geology & Mineralogy
Rock sample characterization, mineral phase mapping, and porosity analysis in geoscience research.
Nanofabrication
Direct-write nanopatterning, device prototyping, and ion beam deposition for nano-devices.
TESCAN FIB-SEM Main Unit (FIB + SEM columns)
TESCAN ESSENCE™ Software License (full suite)
5-Axis Motorized Eucentric Stage
Standard Detector Set (SE, BSE, In-Beam SE/BSE)
Oil-Free Vacuum Pumping System
Control Workstation & Monitor Setup
Standard Sample Holder Kit
On-Site Installation & Commissioning by Certified Engineer
Operator Training Program (3-day on-site)
1-Year Manufacturer Warranty
Technical Support & Maintenance Agreement

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TESCAN FIB-SEM
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